Reno Sub-Systems (Reno), a developer of high-performance radio frequency (RF) matching networks for leading-edge nanoscale semiconductor manufacturing, has introduced its first all solid-state generator and RF matching system. The new system is the first-ever combined EVC match and RF generator unit designed specifically as an integrated system, leveraging Reno’s patented Velocity RF Match and Precis Generator technologies. This combination allows for direct communications between the systems to optimize the performance of both. The system was developed to support a repeat customer of Reno’s Velocity RF Matching Networks.
The company has developed new and disruptive technologies for the semiconductor and advanced microelectronic industries. Leveraging its patented technologies, Reno has demonstrated the highest performance radio frequency matching networks for leading-edge nanoscale manufacturing processes. Reno has generated strong customer demand based on on-tool performance data, which has allowed the company to transition from technology and product development to high volume adoption within two years.
Current RF matching networks have been built on 1940s vacuum variable capacitor (VVC) technology, which was originally patented by Nikola Tesla in 1896. While slight enhancements have been made to the technology in that 120 years, its many moving parts have an analog limitation today of matching in 1-3+ seconds. The variation within that 1-3+ seconds also creates issues for process engineers, especially at leading-edge plasma processing.
Reno’s new RF match and generator system combine the company’s proven Velocity RF Matching Network and Precis Generator technologies in a clean-sheet design that optimizes the performance of both. Historically, the efficiency and magnitude of forward power and reflected power have fueled the process challenges behind today’s RF generators and VVC matching networks in plasma processes. The time required to correct micro-arcing or plasma instability detection has created significant challenges at 14nm and below.
Reno’s solid-state Electronically Variable Capacitor (EVC) matching network is a digital array that achieves run-to-run repeatable and accurate matching technology to enable the specific, high aspect ratio, selectively anisotropic sharp-edge plasma processing. The company’s Precis generator technology delivers the precise power control required for advanced semiconductor manufacturing below 10nm. Combining Reno’s solid-state power generator and EVC matching technologies into one mechanical package with one control system and microsecond step changes allows forward power and reflected power to evolve into efficient delivered power.
John Voltz, senior vice president, business development at Reno Subsystems, commented that developing and launching a fully integrated match and generator system is a major technological accomplishment that once again showcases Reno’s innovation and know-how. It is highly validating that one of their repeat customers would trust them to develop this system for their latest and most advanced process tool. Adding this new integrated product to their portfolio offers significant growth potential as a company, and propels them quickly into the RF generator market, which is roughly twice the TAM of matching networks alone.
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