PCS-RF-AO

RF Plasma Source by SPECS Surface Nano Analysis

Note : Your request will be directed to SPECS Surface Nano Analysis.

PCS-RF-AO Image

The PCS-RF-AO from SPECS Surface Nano Analysis is a RF Plasma Source with Output Frequency 13.56 MHz, Gas Flow Rate 0.1 to 100 SCCM, RF Power Level 400 to 500 W, Power Supply 300 to 600 W. More details for PCS-RF-AO can be seen below.

Product Specifications

Product Details

  • Part Number
    PCS-RF-AO
  • Manufacturer
    SPECS Surface Nano Analysis
  • Description
    Plasma Cracker Atom Source (RF Plasma)

General Parameters

  • Output Frequency
    13.56 MHz
  • Gas Flow Rate
    0.1 to 100 SCCM
  • RF Power Level
    400 to 500 W
  • Gases
    Oxygen, Nitrogen, Hydrogen
  • Operating Pressure
    < 10-7 - 10-5 mbar
  • Application
    MBE, superconductors, optical coatings, dielectrics, reactive sputtering, laser ablation and ceramic growth, oxygen cleaning and oxidation kinetics, post growth oxidation/ low temperature SiO2, growth enhancement / surfactant
  • Power Supply
    300 to 600 W
  • Flange
    4.5 Inches NW63CF
  • Dimension
    300 x 23 mm (Vacuum L X Beam Dia.)

Technical Documents

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